Author

Matyi RJ

MidFlorida Materials & Characterization LLC - Cited by 5,771

Biography

Providing professional services in materials research, materials characterization, and STEM education. Current activities include serving as a consultant in materials-related litigations; developing a business plan for on-line laboratory training; and engaging with customers on materials analysis issues.
Title
Cited by
Year
Extraordinary Photoresponse in Two-Dimensional In2Se3 Nanosheets
RB Jacobs-Gedrim, M Shanmugam, N Jain, CA Durcan, MT Murphy, ...ACS nano 8 (1), 514-521, 2014201
383
2014
Present state of the Avogadro constant determination from silicon crystals with natural isotopic compositions
K Fujii, A Waseda, N Kuramoto, S Mizushima, P Becker, H Bettin, ...ieee Transactions on Instrumentation and Measurement 54 (2), 854-859, 2005200
112
2005
Resolution, LER, and sensitivity limitations of photoresists
GM Gallatin, P Naulleau, D Niakoula, R Brainard, E Hassanein, R Matyi, ...Emerging Lithographic Technologies XII 6921, 417-427, 2008200
80
2008
Reproducibility in X-ray reflectometry: results from the first world-wide round-robin experiment
P Colombi, DK Agnihotri, VE Asadchikov, E Bontempi, DK Bowen, ...Journal of Applied Crystallography 41 (1), 143-152, 2008200
73
2008
Photons, electrons, and acid yields in EUV photoresists: a progress report
R Brainard, E Hassanein, J Li, P Pathak, B Thiel, F Cerrina, R Moore, ...Advances in Resist Materials and Processing Technology XXV 6923, 662-675, 2008200
34
2008
Plasmonic based kinetic analysis of hydrogen reactions within Au− YSZ nanocomposites
NA Joy, CM Settens, RJ Matyi, MA CarpenterThe Journal of Physical Chemistry C 115 (14), 6283-6289, 2011201
34
2011
AlGaAsSb superlattice buffer layer for p-channel GaSb quantum well on GaAs substrate
V Tokranov, P Nagaiah, M Yakimov, RJ Matyi, S OktyabrskyJournal of crystal growth 323 (1), 35-38, 2011201
31
2011
Film quantum yields of EUV and ultra-high PAG photoresists
E Hassanein, C Higgins, P Naulleau, R Matyi, G Gallatin, G Denbeaux, ...Emerging Lithographic Technologies XII 6921, 453-465, 2008200
29
2008
Film quantum yields of ultrahigh PAG EUV photoresists
R Brainard, C Higgins, E Hassanein, R Matyi, A WüestJournal of Photopolymer Science and Technology 21 (3), 457-464, 2008200
27
2008
The international VAMAS project on X-ray reflectivity measurements for evaluation of thin films and multilayers—Preliminary results from the second round-robin
RJ Matyi, LE Depero, E Bontempi, P Colombi, A Gibaud, M Jergel, ...Thin Solid Films 516 (22), 7962-7966, 2008200
25
2008
Fabrication of 5-20 nm thick β-W films
AJ Narasimham, M Medikonda, A Matsubayashi, P Khare, H Chong, ...AIP Advances 4 (11), 2014201
24
2014
Critical dimension small angle X-ray scattering measurements of FinFET and 3D memory structures
C Settens, B Bunday, B Thiel, RJ Kline, D Sunday, C Wang, W Wu, ...Metrology, Inspection, and Process Control for Microlithography XXVII 8681 …, 2013201
24
2013
Ion implantation synthesized copper oxide-based resistive memory devices
SM Bishop, H Bakhru, SW Novak, BD Briggs, RJ Matyi, NC CadyApplied Physics Letters 99 (20), 2011201
19
2011
X-ray reflectometry analyses of chromium thin films
RJ Matyi, MS Hatzistergos, E LifshinThin Solid Films 515 (4), 1286-1293, 2006200
18
2006
Advances in CD‐metrology (CD‐SAXS, Mueller matrix based scatterometry, and SEM)
BL Thiel, AJ Cepler, AC Diebold, RJ MatyiAIP Conference Proceedings 1395 (1), 298-304, 2011201
18
2011
Effect of interface band structure on hot-electron attenuation lengths in Au thin films
AJ Stollenwerk, EJ Spadafora, JJ Garramone, RJ Matyi, RL Moore, ...Physical Review B 77 (3), 033416, 2008200
15
2008
Implementation of statistical dynamic diffraction theory for defective semiconductor heterostructure modelling
PK Shreeman, RJ MatyiJournal of applied crystallography 43 (3), 550-559, 2010201
11
2010
Effect of crystallinity on endurance and switching behavior of HfOx-based resistive memory devices
JO Capulong, BD Briggs, SM Bishop, MQ Hovish, RJ Matyi, NC Cady2012 IEEE International Integrated Reliability Workshop Final Report, 22-25, 2012201
10
2012
Assessment of critical dimension small-angle x-ray scattering measurement approaches for FinFET fabrication process monitoring
C Settens, A Cordes, B Bunday, A Bello, V Kamineni, A Paul, J Fronheiser, ...Journal of Micro/Nanolithography, MEMS, and MOEMS 13 (4), 041408-041408, 2014201
10
2014
Understanding ultra-thin film resist and underlayer performance through physical characterization
C Higgins, S Kruger, V Kamineni, R Matyi, J Georger, R BrainardJournal of Photopolymer Science and Technology 23 (5), 699-707, 2010201
8
2010

Referred From: https://scholar.google.com/citations?view_op=view_citation&hl=en&user=ImMoPPMAAAAJ&citation_for_view=ImMoPPMAAAAJ:BwyfMAYsbu0C

Cited by
Citations 5771
h-index 35
i10-index 90
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