Author

Nolan M

Tyndall National Institute, University College Cork, Ireland - Cited by 8,961 - catalysis - photocatalysis - computational chemistry - metal oxides - atomic layer deposition

Biography

Dr. Nolan M is an researcher works at Experienced Senior Staff with a demonstrated history of securing research funding, industry collaboration, publishing, materials development in catalysis and PhD/postdoc supervision and mentoring.
Title
Cited by
Year
Highly sensitive SERS detection of neonicotinoid pesticides. Complete Raman spectral assignment of clothianidin and imidacloprid
N Creedon, P Lovera, JJ Gutiérrez Moreno, M Nolan, A O’RiordanThe Journal of Physical Chemistry A 124, 7238, 2020202
32
2020
Hydrogen evolution on non-metal oxide catalysts
S Rhatigan, MC Michel, M NolanJournal of Physics: Energy 2 (4), 042002, 2020202
23
2020
Overcoming Pd–TiO2 Deactivation during H2 Production from Photoreforming Using Cu@Pd Nanoparticles Supported on TiO2
F Platero, A López-Martín, A Caballero, TC Rojas, M Nolan, G ColónACS Applied Nano Materials 4 (3), 3204-3219, 2021202
17
2021
Rational development of guanidinate and amidinate based cerium and ytterbium complexes as atomic layer deposition precursors: synthesis, modeling, and application
P Kaur, L Mai, A Muriqi, D Zanders, R Ghiyasi, M Safdar, N Boysen, ...Chemistry–A European Journal 27 (15), 4913-4926, 2021202
14
2021
Cobalt metal ALD: understanding the mechanism and role of zinc alkyl precursors as reductants for low-resistivity co thin films
D Zanders, J Liu, J Obenlüneschloß, C Bock, D Rogalla, L Mai, M Nolan, ...Chemistry of Materials 33 (13), 5045-5057, 2021202
14
2021
Predicting the Effect of Dopants on CO2 Adsorption in Transition Metal Carbides: Case Study on TiC (001)
M Lopez, F Vines, M Nolan, F IllasThe Journal of Physical Chemistry C 124 (29), 15969-15976, 2020202
11
2020
Large piezoelectric response and ferroelectricity in Li and V/Nb/Ta co-doped w-AlN
M Noor-A-Alam, OZ Olszewski, H Campanella, M NolanACS Applied Materials & Interfaces 13 (1), 944-954, 2020202
10
2020
Monolayer doping of germanium with arsenic: A new chemical route to achieve optimal dopant activation
N Kennedy, S Garvey, B Maccioni, L Eaton, M Nolan, R Duffy, F Meaney, ...Langmuir 36 (34), 9993-10002, 2020202
8
2020
A study on the influence of ligand variation on formamidinate complexes of yttrium: New precursors for atomic layer deposition of yttrium oxide
SMJ Beer, N Boysen, A Muriqi, D Zanders, T Berning, D Rogalla, C Bock, ...Dalton Transactions 50 (37), 12944-12956, 2021202
8
2021
On the use of DFT+ U to describe the electronic structure of TiO2 nanoparticles:(TiO2) 35 as a case study
Á Morales-García, S Rhatigan, M Nolan, F IllasThe Journal of chemical physics 152 (24), 2020202
6
2020
Atomic/molecular layer deposition of Ti-organic thin films from different aromatic alcohol and amine precursors
A Tanskanen, P Sundberg, M Nolan, M KarppinenThin Solid Films 73, 13889, 2021202
6
2021
Self-limiting nitrogen/hydrogen plasma radical chemistry in plasma-enhanced atomic layer deposition of cobalt
J Liu, H Lu, DW Zhang, M NolanNanoscale 14 (12), 4712-472, 2022202
5
2022
Control of the Cu morphology on Ru-passivated and Ru-doped TaN surfaces–promoting growth of 2D conducting copper for CMOS interconnects
CL Nies, SK Natarajan, M NolanChemical Science 13 (3), 713-72, 2022202
5
2022
Negative Piezoelectric Coefficient in Ferromagnetic 1H-LaBr2 Monolayer
M Noor-A-Alam, M NolanACS Applied Electronic Materials 4 (2), 80-8, 2022202
5
2022
Reactions of ruthenium cyclopentadienyl precursor in the metal precursor pulse of Ru atomic layer deposition
J Liu, H Lu, DW Zhang, M NolanJournal of Materials Chemistry C 9 (8), 2919-2932, 2021202
5
2021
Role of terminal groups in aromatic molecules on the growth of Al 2 O 3-based hybrid materials
A Muriqi, M Karppinen, M NolanDalton Transactions 0 (47), 1783-1793, 2021202
5
2021
Dual promotional effect of Cu x O clusters grown with atomic layer deposition on TiO 2 for photocatalytic hydrogen production
S Saedy, N Hiemstra, D Benz, H Van Bui, M Nolan, JR van OmmenCatalysis Science & Technology 12 (1), 511-523, 2022202
4
2022
Modification of TiO2 with metal chalcogenide nanoclusters for hydrogen evolution
S Rhatigan, L Niemitz, M NolanJournal of Physics: Energy 3 (2), 025001, 2021202
4
2021
Origin of enhanced thermal atomic layer etching of amorphous HfO2
R Mullins, JJ Gutiérrez Moreno, M NolanJournal of Vacuum Science & Technology A 40 (2), 2022202
3
2022
Mechanism of Thermal Atomic Layer Etch of W Metal Using Sequential Oxidation and Chlorination: A First-Principles Study
S Kondati Natarajan, M Nolan, P Theofanis, C Mokhtarzadeh, ...ACS applied materials & interfaces 12 (2), 6670-6680, 2020202
3
2020

Referred From: https://scholar.google.co.in/citations?user=NHw-9lYAAAAJ&hl=en

Cited by
Citations 8961
h-index 50
i10-index 122
Open Access Journals